Growth of TiOx films by high power pulsed magnetron sputtering from a compound TiO1.8 target


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Output type: Journal article

UM6P affiliated Publication?: No

Author list: Sarakinos K., Alami J., Klever C., Wuttig M.

Publisher: INST PROBLEMS MECHANICAL ENGIN

Publication year: 2007

Volume number: 15

Issue number: 1

Start page: 44

End page: 48

Number of pages: 5

ISSN: 1606-5131

URL: https://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=38549109684&origin=inward


Abstract

High power pulsed magnetron sputtering (HPPMS) has been employed for the growth of TiOx (x > 1.8) films from a ceramic TiO1.8 target in an Ar-O2 ambient. The film properties have been compared to those deposited by dc magnetron sputtering (dcMS). Both HPPMS and dcMS films exhibit an amorphous structure and are transparent. Furthermore, films grown by HPPMS have improved properties, such as higher density, higher refractive index and smoother film surface, as compared to those deposited by dcMS. © 2007 Advanced Study Center Co. Ltd.


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Last updated on 2020-13-07 at 17:14